ASML

ASML Holding NV ADR
NASDAQTECHNOLOGYSEMICONDUCTOR EQUIPMENT & MATERIALS

Key Statistics

Market Cap
$658.69B
P/E Ratio
58.13
EPS
$29.50
Beta
1.36
52W High
$1997.38
52W Low
$785.84
50-Day MA
$1751.47
200-Day MA
$1480.53
Dividend Yield
0.53%
Profit Margin
30.10%
Forward P/E
27.03
PEG Ratio
1.47

About ASML Holding NV ADR

ASML Holding NV develops, produces, markets, sells and services advanced semiconductor equipment systems consisting of lithography, metrology and inspection related systems for memory and logic chip manufacturers. The company is headquartered in Veldhoven, the Netherlands.

Official WebsiteUSAFY End: December

Fundamentals

Revenue (TTM)$35.33B
Gross Profit (TTM)$18.63B
EBITDA$13.49B
Operating Margin37.10%
Return on Equity53.90%
Return on Assets16.50%
Revenue/Share (TTM)$1.65
Book Value$1.19
Price-to-Book24.99
Price-to-Sales (TTM)18.65
EV/Revenue15.32
EV/EBITDA46.05
Quarterly Earnings Growth (YoY)28.50%
Quarterly Revenue Growth (YoY)21.30%
Shares Outstanding$384.10M
Float$21.33B
% Insiders0.02%
% Institutions20.39%

Historical Volatility

HV 10-Day
30.14%
HV 20-Day
33.40%
HV 30-Day
43.01%
HV 60-Day
53.05%
HV Rank
48.0%

Volatility is currently contracting

Analyst Ratings

Consensus ($2166.70 target)
6
Strong Buy
32
Buy
4
Hold
1
Sell

Latest News

ASML stock gains as Samsung, TSMC High NA EUV adoption boosts outlook

Samsung and TSMC, two of the world's largest semiconductor manufacturers, are moving ahead with ASML's most advanced chipmaking equipment, strengthening the case for continued growth at the Dutch lithography giant as artificial intelligence drives demand for increasingly sophisticated chips. ASML's US-listed stock rose about 3% during premarket trading on Tuesday, while its Amsterdam-listed shares rose over 1%.

Invezz9/8/2026Positive
ASML and TSMC Announce Initiative to Pioneer Industry Transition to Large-Format Photomasks for High NA EUV

ASML and TSMC Announce Initiative to Pioneer Industry Transition to Large-Format Photomasks for High NA EUV On September 7, in advance of the SPIE Bacus Conference, ASML and TSMC formed a collaborative industry initiative to drive the transition to 12-inch photomasks, maximizing the value of High NA EUV lithography. The initiative targets establishing a 12-inch mask pilot line by 2031, supporting full lithography system readiness for advanced node production by 2033.

GlobeNewsWire9/8/2026Neutral

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Data last updated: 9/8/2026